論文 - 梅津 郁朗
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Optical absorption and resonance Raman scattering of carbon nanotubes
Kataura H, Kumazawa Y, Kojima N, Maniwa Y, Umezu I, Masubuchi S, Kazama S, Zhao X, Ando Y, Ohtsuka Y, Suzuki S, Achiba Y
ELECTRONIC PROPERTIES OF NOVEL MATERIALS - SCIENCE AND TECHNOLOGY OF MOLECULAR NANOSTRUCTURES 486 328 - 332 1999年
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Effects of thermal processes on photoluminescence of silicon nanocrystallites prepared by pulsed laser ablation
Umezu I, Shibata K, Yamaguchi S, Sugimura A, Yamada Y, Yoshida T
JOURNAL OF APPLIED PHYSICS 84 ( 11 ) 6448 - 6450 1998年12月
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Nano-oxidation of vanadium thin films using atomic force microscopy
Vaccaro PO, Sakata S, Yamaoka S, Umezu I, Sugimura A
JOURNAL OF MATERIALS SCIENCE LETTERS 17 ( 22 ) 1941 - 1943 1998年11月
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Effect of plasma treatment on the density of defects at an amorphous Si : H-insulator interface
Umezu I, Kuwamura T, Kitamura K, Tsuchida T, Maeda K
JOURNAL OF APPLIED PHYSICS 84 ( 3 ) 1371 - 1377 1998年8月
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Defect formation mechanism during plasma enhanced chemical vapor deposition of undoped a-Si : H
Maeda K, Umezu I
JOURNAL OF NON-CRYSTALLINE SOLIDS 227 43 - 47 1998年5月
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A study of interface state density between a-Si : H and insulating layer in terms of plasma surface reaction
Umezu I, Tsuchida T, Maeda K
JOURNAL OF NON-CRYSTALLINE SOLIDS 227 1235 - 1239 1998年
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Temperature-dependent photoluminescence of silicon nanocrystallites prepared by inert-gas-ambient pulsed laser ablation
Umezu I, Yamaguchi S, Shibata K, Sugimura A, Yamada Y, Yoshida T
MATERIALS AND DEVICES FOR SILICON-BASED OPTOELECTRONICS 486 219 - 224 1998年
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Defect formation during deposition of undoped a-Si:H by rf glow discharge
Maeda K, Umezu I, Ishizuka H
PHYSICAL REVIEW B 55 ( 7 ) 4323 - 4331 1997年2月
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Defect formation mechanism during PECVD of a-Si : H
Maeda K, Umezu I
AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997 467 573 - 578 1997年
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Investigation of interface state density between a-Si:H and insulating layers by ESR and photothermal deflection spectroscopy
Umezu I, Kitamura K, Maeda K
JOURNAL OF NON-CRYSTALLINE SOLIDS 198 778 - 781 1996年5月
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Optical properties of silicon nanocrystallites prepared by excimer laser ablation in inert gas
Yamada Y, Orii T, Umezu I, Takeyama S, Yoshida T
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 35 ( 2B ) 1361 - 1365 1996年2月
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Defect formation during deposition of undoped a-Si:H by PECVD
Maeda K, Umezu I
AMORPHOUS SILICON TECHNOLOGY - 1996 420 569 - 574 1996年
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Optical properties of silicon nanocrystallites prepared by pulsed laser ablation in inert gas ambient
Yoshida T, Yamada Y, Takeyama S, Orii T, Umezu I, Makita Y
LASER PROCESSING OF MATERIALS AND INDUSTRIAL APPLICATIONS 2888 6 - 13 1996年
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A COMPARATIVE-STUDY ON STRUCTURAL AND ELECTRONIC-PROPERTIES OF PECVD A-SIOX WITH A-SINX
MAEDA K, SAKAMOTO N, UMEZU I
JOURNAL OF NON-CRYSTALLINE SOLIDS 187 287 - 290 1995年7月
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MECHANISM OF SURFACE-REACTION IN THE DEPOSITION PROCESS OF ALPHA-SI-H BY RF GLOW-DISCHARGE
MAEDA K, KUROE A, UMEZU I
PHYSICAL REVIEW B 51 ( 16 ) 10635 - 10645 1995年4月
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OPTICAL-BOND GAP AND TAUC GAP IN A-SIOX-H AND A-SINX-H FILMS
UMEZU I, MIYAMOTO K, SAKAMOTO N, MAEDA K
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 34 ( 4A ) 1753 - 1758 1995年4月
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ANALYSIS OF JOULE HEAT IN A-SI-H FILM BY PHOTOTHERMAL DETECTION SPECTROSCOPY
UMEZU, I, K MAEDA
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 33 ( 10 ) 5647 - 5651 1994年10月
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出版者・発行元:JAPAN J APPLIED PHYSICS
Photothermal deflection (PD) signals without applied bias are a direct observation of nonradiative recombination processes of photoexcited carriers, which strongly correlate with photocurrent under applied bias. The PD signal under DC bias was carefully compared with the photocurrent (PC) signal in the energy region around and above the band gap. A large dip, which was not observed in PC spectra, was observed in PD spectra in the spectral region near the absorption edge. This spectral feature was discussed from the standpoint of Joule heat due to drift of photocarriers. We have pointed out that dark Joule heat (W-d) and effective applied voltage (V-s) are important in analysis. By taking into account these parameters, the experimental spectrum of PD signals under DC bias was successfully reproduced. It is concluded that variation of V-s which arises from large photosensitivity causes a dip in PD spectra. No evidence of the photon energy dependence of the recombination process was observed in PD spectra.
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DEPLETION LAYER WIDTH IN UNDOPED A-SI-H SCHOTTKY-BARRIER REVEALED BY REVERSE BIAS PHOTOCURRENT
K MAEDA, W CHIYODA, UMEZU, I, A KUROE
JOURNAL OF APPLIED PHYSICS 75 ( 7 ) 3522 - 3529 1994年4月
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出版者・発行元:AMER INST PHYSICS
Reverse bias photocurrent of undoped a-Si:H Schottky barrier was investigated under excitation with uniformly absorbed light. Dependence of the photocurrent on the applied voltage V gives unambiguous dependence of the depletion layer width W on voltage V, which cannot be obtained by conventional capacitance-voltage measurements for undoped a-Si:H. There are two voltage ranges giving parabolic dependence of W with different apparent ionized donor densities due to a spatial variation of the space-charge density. These observations are considered to be characteristic of semiconductors with major deep gap states of large energy width. The experimental results were analyzed using a simple model of energy distribution of the gap state density of dividing the depletion layer into two. In one of these deep depletion occurs. The variation of the apparent W-V relation observed upon lowering the exciting photon energy was analyzed to be related to a decrease in the absorption coefficient with the applied voltage due to an emptying of the initial states of the gap state absorption. Results of the analysis are consistent with the electron-spin density observed in the same undoped a-Si:H.
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Analysis of joule heat in a-Si:H film by photothermal deflection spectroscopy
Ikurou Umezu, Keiji Maeda
Japanese Journal of Applied Physics 33 ( 10R ) 564 - 561 1994年
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Photothermal deflection (PD) signals without applied bias are a direct observation of nonradiative recombination processes of photoexcited carriers, which strongly correlate with photocurrent under applied bias. The PD signal under DC bias was carefully compared with the photocurrent (PC) signal in the energy region around and above the band gap. A large dip, which was not observed in PC spectra, was observed in PD spectra in the spectral region near the absorption edge. This spectral feature was discussed from the standpoint of Joule heat due to drift of photocarriers. We have pointed out that dark Joule heat (W d) and effective applied voltage (V S) are important in analysis. By taking into account these parameters, the experimental spectrum of PD signals under DC bias was successfully reproduced. It is concluded that variation of V S which arises from large photosensitivity causes a dip in PD spectra. No evidence of the photon energy dependence of the recombination process was observed in PD spectra. © 1994 IOP Publishing Ltd.
DOI: 10.1143/JJAP.33.5647
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INTERFACE STATE DENSITY OF SINX-H/C-SI MIS STRUCTURE
MAEDA K, JINNAI T, UMEZU I
JOURNAL OF NON-CRYSTALLINE SOLIDS 166 849 - 852 1993年12月
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